Chemical Vapour Deposition

Inventory Classification
  • Process Equipment: Physical
  • Thin Film Deposition
  • Chemical Vapour Deposition

A plasma jet is a plasma source where a pair of metal electrodes with a sharp point, contained in a cylinder made of dielectric material, and is connected to a high voltage generator. A stream of Helium or Argon is blown in the insulated cylinder so that the electrode finds itself in contact with the gas. Due to the high electric field near the electrode’s sharp point, Helium or Argon ionizes and a mixture of electrons, ions and metastable atoms and molecules is blown by the flow stream towards the exit nozzle.

University Tag Number: 
184823
Availability: 
Contact Custodian for availability
  • James Bahr
Location
Research I Addition
Room Number: 
1238
Inventory Classification
  • Process Equipment: Physical
  • Thin Film Deposition
  • Chemical Vapour Deposition

Plasma Enhanced Chemical Vapor Deposition: PECVD • 13.56 MHz driven parallel plate reactor • kHz and "frequency mixing" optional • shower head gas inlet optimized for PECVD • 400° C and 700° C substrate electrodes

University Tag Number: 
173251
Availability: 
Contact Custodian for availability
  • Greg Strommen
Location
Research II
Room Number: 
122C