Used to create a patterned layer of metal on a conductive surface. Capable of electroplating both 150mm and 200mm wafers. Plating height can range from a few microns to fifty or more. Up to 900 ma current.
The KSV Minimicro is a small and elegant Langmuir and Langmuir-Blodgett (LB) device brilliant for depositions on small substrates or to minimize sample volumes. Promising methods for the preparation of thin films as it enables
(A) precise control of the monolayer thickness,
(B) homogeneous deposition of the monolayer over large areas and
(C) the possibility to make multilayer structures with varying layer composition.
Coating depositions are conducted on a Symyx® bench top unit that can generate coating films using casting or drawdown methods. The unit features 12 mini blenders for high shear mixing of materials with short working times. This allows for reactive components to be added just before the films are formed. Liquid coatings and reagents are transferred using 1ml positive displacement tips and can be positioned in heated and magnetically stirred bays. Microtiter format substrates are delivered to the system with a Velocity 11 BenchCel 4xTM for coating deposition.