CCAST provides large-scale, state-of-the-art computing resources to the users:
The Thunder cluster consists of 53 compute nodes and 2 login nodes. The total aggregated theroretical peak performance is ~40TFLOPS. All these nodes are interconnected with FDR Infiniband at a 56Gbit/s transfer rate. The system details are shown below
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Center for Computationally Assisted Science & Technology
CheckSum Manufacturing Defects Analyzers (MDAs) provide the capability to quickly and easily test assemblies for common manufacturing defects such as incorrect, missing or misoriented components, and opens and shorts.
The second synthesis system is a Chemspeed Autoplant A100TM. This reactor system can handle more complex process conditions than the batch system. The system consists of 12 reactor modules. Each reactor module contains two 100-ml stainless steel reactors having mechanical stirring and reflux cooling. The temperature in each reactor can be controlled independently over a range of -10 to 250 °C. Solid and liquid reagents can be automatically charged to each reactor. In batch mode, up to 24 reactions can be run simultaneously.
LECO’s CHNS-932 Elemental Analyzer is capable of determining the amount of carbon, hydrogen, nitrogen and sulfur present in a homogeneous aliquot weighing approximately 0.6–1.6mg (2.0mg maximum). An aliquot is weighed and placed into either a tin or silver capsule in which it is appropriately crimped. During the analysis, the aliquot is dropped into a furnace held at 1,000°C. At the same time the sample drops into the furnace, a dose of oxygen is released into the furnace. This causes the sample to readily combust forming gases of COX, H2O, N2, and SOX.
A highly sophisticated gas sorption analyzer available with up to three physisorption analysis ports for surface area analysis and pore size measurements, two of which can be equipped for low pressure micropore analysis including optional 0.1 torr transducer(s).
The Lesker CMS 18 Deposition System (PVD 4) is a 4 source RF, 2 source pulsed DC sputter deposition system. Each source can accommodate 3” diameter targets of maximum 0.250” thickness. Conductors are best suited for DC sputtering. Insulators are best suited for RF sputtering. Oxide/nitride deposition is also possible via reactive sputtering, by utilizing pulsed DC sputtering and careful gas flow control.
CMS-18 thin film deposition system offers wide possibilities for preparation of known and new materials and structures in the form of thin films.
Four magnetron sources allow preparation of various materials (metal, semiconductor, dielectric, metastable etc.) in a wide range of compositions and structures using deposition, code position, sequential deposition and reactive deposition processes.
The preparation of coating formulations involves the dispensing and mixing of a variety of polymers, crosslinkers, catalysts, and other additives. Many resins and crosslinkers are relatively high viscosity materials and can be difficult to handle. Dispensing of these resins is accomplished through the use of disposable pipette tips and mixing by magnetic stirring. By using a disposable tip for each dispense, the chance for cross contamination is reduced and the need to thoroughly wash the pipette between each use is eliminated.
An automated system for measuring color and gloss has been developed at NDSU. This system is compatible with all of the flat substrates generated by the CMRL. The on-board computer up-loads the data to a central database for easy access through a web based browser. Color measurements are made with an X-rite integrating sphere spectrophotometer while gloss measurements are made with a BYK-Gardner gloss meter reading at 3 different angles.