PLASMA LAB 100 SYSTEM

Oxford Plasmalab 100 PECVD
Liquid and solid precursor to system modified Nitride and Si02 films. Boron and silicon carbide deposition. Anamorphous silicon deposition single wafer load lock capable of 100 mm to 200 mm. System modified for Liquid and Solid Precursor deposition.

University Tag Number: 
173012
Serial Number: 
219830
Availability: 
Contact Custodian for availability
Location
Research II
Room Number: 
122C
Acquisition Date: 
January 1, 2005