PLASMALAB SYSTEM 100 PECVD
Inventory Classification
Plasma Enhanced Chemical Vapor Deposition: PECVD • 13.56 MHz driven parallel plate reactor • kHz and "frequency mixing" optional • shower head gas inlet optimized for PECVD • 400° C and 700° C substrate electrodes
University Tag Number:
173251
Serial Number:
94-721004
Availability:
Contact Custodian for availability
Location
Research II
Room Number:
122C
Acquisition Date:
January 26, 2007