Solitec 5110ND Developer Track
Inventory Classification
Used to develop photo resist on wafers and substrates up to 230 mm. Adjustable speed from 50 to 8,000 rpm with ±10 rpm resolution. Dual N2 aspirated atomizing nozzles. Constant 2-3 psi nozzle pressure regardless of fluid level.
University Tag Number:
178572
Availability:
Contact Custodian for availability
Location
Research II
Room Number:
122B
Acquisition Date:
June 30, 2008