Molecular Beam Epitaxy

Inventory Classification
  • Process Equipment: Physical
  • Thin Film Deposition
  • Molecular Beam Epitaxy

Oxford Plasmalab 100 PECVD
Liquid and solid precursor to system modified Nitride and Si02 films. Boron and silicon carbide deposition. Anamorphous silicon deposition single wafer load lock capable of 100 mm to 200 mm. System modified for Liquid and Solid Precursor deposition.

University Tag Number: 
173012
Availability: 
Contact Custodian for availability
  • Greg Strommen
Location
Research II
Room Number: 
122C
Inventory Classification
  • Process Equipment: Physical
  • Thin Film Deposition
  • Molecular Beam Epitaxy

•2D Inspection
•Under screen cleaner
•Paste dispenser
•Standard board clamps
•Board stop at camera head
•Max Stencil Size 29” x 29”
•Form flex pins tooling

University Tag Number: 
171768
Availability: 
Contact Custodian for availability
  • Frederik Haring
Location
Research II
Room Number: 
126A