Acid Utility Bench
Inventory Classification
Contains a Piranha cleaning solution to remove organic materials from substrates and a temperature controlled cascading Hydrofluoric Acid (HF) bath for etching oxide layers from silicon wafers. It has a dump rinser, DI water (de-ionized water) sink and teflon guns for the N2 and DI water.
University Tag Number:
171664
Availability:
Contact Custodian for availability
Location
Research II
Room Number:
122C
Acquisition Date:
April 1, 2004