The second synthesis system is a Chemspeed Autoplant A100TM. This reactor system can handle more complex process conditions than the batch system. The system consists of 12 reactor modules. Each reactor module contains two 100-ml stainless steel reactors having mechanical stirring and reflux cooling. The temperature in each reactor can be controlled independently over a range of -10 to 250 °C. Solid and liquid reagents can be automatically charged to each reactor. In batch mode, up to 24 reactions can be run simultaneously.
A highly sophisticated gas sorption analyzer available with up to three physisorption analysis ports for surface area analysis and pore size measurements, two of which can be equipped for low pressure micropore analysis including optional 0.1 torr transducer(s).
Highly Accelerated Stress Test (HAST) Chamber (vendor: ESPEC, model EHS-211M)
HAST exposes assemblies to 85% relative humidity at 100 °C, at up to 4 atm pressure. This drives moisture into organic packaging structures and triggers ionic corrosion.
With the Hege 11 liquid seed treater it is possible to treat different quantities of seed using three different sizes of seed bowls for small quantities (20 – 3000 g).
■Seed bowls easily changed for different quantities
■Suitable for all types of seed
■Accurate dosing of the seed treatment ensures consistently high quality of treatment on every single seed (even with small quantities)
■Preservation of germination ability due to careful treatment
The Maizer is a small batch sheller for single ear or bulk samples. As it removes kernels from the cob it also separates the grain, cob and dust into isolated paths.
Small batch sheller for single ear or bulk samples using rubber belting for minimal seed breakage. Excellent clean-out capabilities with no carry-over between samples.
Buehler’s SimpliMet 1000 automatic mounting press is used to mount specimens with thermosetting resins, including Phenolics, EpoMet, ProbeMet, KonductoMet I, and Diallyl Phthalate. Easy to change molds are offered in a full range of sample sizes from 1 to 2 (25 mm–50 mm).
Used to etch away unwanted metals from substrates or wafers. Has a 6in x 7in workpiece capacity. The workpiece rotates and moves up and down in the spray process chamber. The station consists of PVC construction, titanium hardware and PVC plumbing.
Used for wet developing. It helps develop the patterns that have been masked onto the substrates.
Used for wet stripping. Polypropylene construction for use as a resist stripping machine.