Plasma Enhanced Chemical Vapor Deposition: PECVD • 13.56 MHz driven parallel plate reactor • kHz and "frequency mixing" optional • shower head gas inlet optimized for PECVD • 400° C and 700° C substrate electrodes
200mm spin coater with GYRSET system for better uniformity and lower resin consumption, stainless base cabinet, multiple dispense capability for up to 2 photoresist, 1 nitrogen, and 1 solvent line. Maximum 5000 rpm/sec acceleration, motorized dispense arm, Cybor 5026 pump (05026-60-57-52C6-OP-C6-OK) with 512 power supply, and controller.
Coating depositions are conducted on a Symyx® bench top unit that can generate coating films using casting or drawdown methods. The unit features 12 mini blenders for high shear mixing of materials with short working times. This allows for reactive components to be added just before the films are formed. Liquid coatings and reagents are transferred using 1ml positive displacement tips and can be positioned in heated and magnetically stirred bays. Microtiter format substrates are delivered to the system with a Velocity 11 BenchCel 4xTM for coating deposition.
CMS-18 thin film deposition system offers wide possibilities for preparation of known and new materials and structures in the form of thin films.
Four magnetron sources allow preparation of various materials (metal, semiconductor, dielectric, metastable etc.) in a wide range of compositions and structures using deposition, code position, sequential deposition and reactive deposition processes.