Thin Film Deposition

Inventory Classification
  • Process Equipment: Physical
  • Thin Film Deposition
  • Chemical Vapour Deposition

Plasma Enhanced Chemical Vapor Deposition: PECVD • 13.56 MHz driven parallel plate reactor • kHz and "frequency mixing" optional • shower head gas inlet optimized for PECVD • 400° C and 700° C substrate electrodes

University Tag Number: 
173251
Availability: 
Contact Custodian for availability
  • Greg Strommen
Location
Research II
Room Number: 
122C
Inventory Classification
  • Process Equipment: Physical
  • Thin Film Deposition
  • Molecular Beam Epitaxy

•2D Inspection
•Under screen cleaner
•Paste dispenser
•Standard board clamps
•Board stop at camera head
•Max Stencil Size 29” x 29”
•Form flex pins tooling

University Tag Number: 
171768
Availability: 
Contact Custodian for availability
  • Frederik Haring
Location
Research II
Room Number: 
126A
Inventory Classification
  • Process Equipment: Physical
  • Thin Film Deposition
  • Sputterer

200mm spin coater with GYRSET system for better uniformity and lower resin consumption, stainless base cabinet, multiple dispense capability for up to 2 photoresist, 1 nitrogen, and 1 solvent line. Maximum 5000 rpm/sec acceleration, motorized dispense arm, Cybor 5026 pump (05026-60-57-52C6-OP-C6-OK) with 512 power supply, and controller.

University Tag Number: 
170500
Availability: 
Contact Custodian for availability
  • Greg Strommen
Location
Research II
Room Number: 
122B
Inventory Classification
  • Process Equipment: Physical
  • Thin Film Deposition
  • Electrodeposition

Coating depositions are conducted on a Symyx® bench top unit that can generate coating films using casting or drawdown methods. The unit features 12 mini blenders for high shear mixing of materials with short working times. This allows for reactive components to be added just before the films are formed. Liquid coatings and reagents are transferred using 1ml positive displacement tips and can be positioned in heated and magnetically stirred bays. Microtiter format substrates are delivered to the system with a Velocity 11 BenchCel 4xTM for coating deposition.

University Tag Number: 
169558
Availability: 
Contact Custodian for availability
  • James Bahr
Location
Research I Addition
Room Number: 
1226
Inventory Classification
  • Process Equipment: Physical
  • Thin Film Deposition
  • Sputterer

CMS-18 thin film deposition system offers wide possibilities for preparation of known and new materials and structures in the form of thin films.
Four magnetron sources allow preparation of various materials (metal, semiconductor, dielectric, metastable etc.) in a wide range of compositions and structures using deposition, code position, sequential deposition and reactive deposition processes.

University Tag Number: 
173003
Availability: 
Contact Custodian for availability
  • Greg Strommen
Location
Research II
Room Number: 
122C