This covers equipment which produces a sample or specimen through physical or mechanical means or through chemical routes, but excluding biochemical and biomolecular processes.
CMS-18 thin film deposition system offers wide possibilities for preparation of known and new materials and structures in the form of thin films.
Four magnetron sources allow preparation of various materials (metal, semiconductor, dielectric, metastable etc.) in a wide range of compositions and structures using deposition, code position, sequential deposition and reactive deposition processes.
The Lesker CMS 18 Deposition System (PVD 4) is a 4 source RF, 2 source pulsed DC sputter deposition system. Each source can accommodate 3” diameter targets of maximum 0.250” thickness. Conductors are best suited for DC sputtering. Insulators are best suited for RF sputtering. Oxide/nitride deposition is also possible via reactive sputtering, by utilizing pulsed DC sputtering and careful gas flow control.
The PGW40 equips the researcher with a walk-in environment accessible from two large doors on the front of the chamber. This model is ideally suited for research involving taller classified plants. The extended growth height ensures that most plants can be grown to full maturity within a moderate to high light regime. Also available with the PGW40 are low-temp options for running the chamber at temperatures below the standard 4˚C. A defrost option is also available which prevents a temperature rise during the defrost cycle.
The PGW40 equips the researcher with a walk-in environment accessible from two large doors on the front of the chamber. This model is ideally suited for research involving taller classified plants. The extended growth height ensures that most plants can be grown to full maturity within a moderate to high light regime. Also available with the PGW40 are low-temp options for running the chamber at temperatures below the standard 4˚C. A defrost option is also available which prevents a temperature rise during the defrost cycle.
The GR64 is a highly economical platform for providing a controlled environment in a walk-in configuration. This chamber offers low to moderate level light intensities using multiple light canopies. The temperature range is narrower than on other Conviron walk-in chambers which affords greater energy efficiency and economy. The multi-lamp-canopy configuration enables researchers to have several experiments running simultaneously with plants at varying levels of maturity.
The GR64 is a highly economical platform for providing a controlled environment in a walk-in configuration. This chamber offers low to moderate level light intensities using multiple light canopies. The temperature range is narrower than on other Conviron walk-in chambers which affords greater energy efficiency and economy. The multi-lamp-canopy configuration enables researchers to have several experiments running simultaneously with plants at varying levels of maturity.
Cressington 108 Sputter Coaters are ideal for routine sample preparation. Compact, economical and simple to operate, they offer rapid pumpdown times, fine-grain coatings and negligible sample heating. Cool, fine-grain sputtering is achieved with a very efficient dc magnetron head. A quick-change target method allows a range of metals to be used. The safety interlocked sputtering supply is fully variable and setting the sputter current is not influenced by vacuum level.
The Cressington Coater offers real solutions to the problems encountered when coating difficult samples for FE-SEM. To minimize the effects of grain size the unit offers a full range of coating materials and gives unprecedented control over thickness and deposition conditions. To minimize charging effects the stage design and wide range of operating pressures allows precise control of the uniformity and conformity of the coating. The HIGH/LOW chamber configuration allows easy adjustment of working distance.
