This covers equipment which produces a sample or specimen through physical or mechanical means or through chemical routes, but excluding biochemical and biomolecular processes.
The Pasta batch Drier we have was made by Standard Industry here in Fargo, ND. It is a batch style, which means we can dry about 200 lbs. in a batch, and it takes about 13-15 hours to dry the pasta we place inside.
The smooth internal surfaces of a Patterson-Kelly blender, with no internal baffles, shafts or bearings, allow unobstructed material flow, as well as complete discharge through a gate valve. The absence of residual material, together with easy access to internal surfaces through the discharge valve and doors at the ends of the cylinders, allows thorough sanitizing in minutes, preventing cross-contamination between changeovers.
The PE-50 XL is a feature packed, low cost, entry level option for low pressure plasma systems.
This is a robust machine that is perfect for small production facilities, research labs, universities, medical facilities, or any industry needing a small-scale, cost-effective plasma processing solution. It has all the features of the PE-50 but also features a larger chamber size for larger processing applications, including production level plasma surface modification.
Over the years, Percival Scientific has designed chambers for a large number of applications. Steady demand for our Arabidopisis Series of chambers has allowed us to engineer a chamber for the optimum growth of the Arabidopsis plant.
The Arabidopsis Series features:
Adequate space for growing the plant to full maturity
Vertical upward air flow to minimize heat from the underlying light fixture
A large number of humidity control options
IntellusUltra Controller allows you to control temperature, humidity, CO2 and lighting.
PLC controller with touch screen provides an intuitive graphical interface and real time process representation
Flexible shelf architecture allows processing of a wide variety of part carriers in either direct or downstream plasma mode
13.56 MHz RF generator has automatic impedance matching for unparalleled process reproducibility
Proprietary software control system generates process and production data for statistical process control
Oxford Plasmalab 100 PECVD
Liquid and solid precursor to system modified Nitride and Si02 films. Boron and silicon carbide deposition. Anamorphous silicon deposition single wafer load lock capable of 100 mm to 200 mm. System modified for Liquid and Solid Precursor deposition.
A plasma jet is a plasma source where a pair of metal electrodes with a sharp point, contained in a cylinder made of dielectric material, and is connected to a high voltage generator. A stream of Helium or Argon is blown in the insulated cylinder so that the electrode finds itself in contact with the gas. Due to the high electric field near the electrode’s sharp point, Helium or Argon ionizes and a mixture of electrons, ions and metastable atoms and molecules is blown by the flow stream towards the exit nozzle.
Plasma Enhanced Chemical Vapor Deposition: PECVD • 13.56 MHz driven parallel plate reactor • kHz and "frequency mixing" optional • shower head gas inlet optimized for PECVD • 400° C and 700° C substrate electrodes
