Symyx Rapid GPCTM is a high throughput method for characterizing polymer molecular weight and molecular weight distribution. This system includes a sample preparation system that is used to dilute the polymer samples and inject the samples into the GPC system. The sample preparation system has heated liquid dispensing pipettes for handling viscous polymers. The GPC system uses high-speed columns and an evaporative light scattering detector. Samples can be analyzed in as little as 10 minutes.
The Symyx Parallel DMTATM system measures the viscoelastic response of an array of 96 polymers or coatings as a function of temperature, or isothermally. Modulus, glass transition temperature (Tg) and crosslink density can be determined for individual samples.
Coating friction, tack, wear, and chemical resistance measurements can be performed on coatings applied to glass and metal substrates using this Symyx Tools bench top system. The essential element of this tool is a disposable steel sphere fitted to a dual axis force transducer mounted to the end of an XYZ robotic arm. The spherical probe, selected from more than 100 loaded on the deck, is then brought into contact with the coating at a specified force and moved back and forth or up and down depending on the measurement being made.
Coating depositions are conducted on a Symyx® bench top unit that can generate coating films using casting or drawdown methods. The unit features 12 mini blenders for high shear mixing of materials with short working times. This allows for reactive components to be added just before the films are formed. Liquid coatings and reagents are transferred using 1ml positive displacement tips and can be positioned in heated and magnetically stirred bays. Microtiter format substrates are delivered to the system with a Velocity 11 BenchCel 4xTM for coating deposition.
Multichannel Pipetting System
A TecanTM EVO multichannel pipetting system is used for formulation dispensing and other sample work-up needs. Eight independently addressable pipettes are mounted on one robot arm allowing dispensation into eight wells in a single operation. Under deck stirring and plate manipulation are also possible with this station.
Designed for use with the JEOL JSM-6490LV scanning electron microscope, where it permits live SEM observation/recording of visible changes in tested materials through failure. Also can be used with the optical microscope or as a data-logging test module, with no image display.
TA Instruments’ Q500 is a high performance research grade thermogravimetric analyzer equipped with a responsive low-mass furnace, sensitive thermobalance, and efficient horizontal purge gas system. Its robust easy-to-use software makes the Q500 perfect for the multi-user laboratory where a wide variety of TGA applications are conducted and where future expansion of analytical work is anticipated. (TA Instruments Webpage: Q500 Thermogravimetric Analyzer) Thermogravimetric Analysis (TGA) measures weight changes in a material as a function of temperature or time under a controlled atmosphere.
TA Instruments’ TMA Model 2940 is an industry standard research grade thermomechanical analyzer with flexibility in operating modes, test probes, fixtures, and available signals. The open architecture allows for easy sample loading and probe placement. Flexibility of sample thermocouple allows for precise positioning in order to optimize temperature measurement.
Toho FLX-2320-S Thin Film Stress Measurement Systems offer industry standard capabilities for mass production and research facilities that demand accurate stress measurements on various films and substrates up to 200mm in diameter. Incorporating KLA-Tencor’s patented “Dual Wavelength” technology, Toho FLX Series tools determine and analyze surface stress caused by deposited thin films. The Toho FLX systems offer outstanding value in a variety of comprehensive Stress Measurement Solutions that utilize advanced measurement principles.
CMS-18 thin film deposition system offers wide possibilities for preparation of known and new materials and structures in the form of thin films.
Four magnetron sources allow preparation of various materials (metal, semiconductor, dielectric, metastable etc.) in a wide range of compositions and structures using deposition, code position, sequential deposition and reactive deposition processes.
